Abstract:
The atmospheric RF plasma thin film deposition system was reassembled and used to deposit SiO_{2} coatings. These coatings were deposited on microscope glass slide substrates as well as the exterior of cylindrical glass tubes. An aluminum rod was also used as a substrate. The atmospheric system was modified to work as a vacuum system so thin film coatings could be deposited on the interior of glass tubes. A water cooled coil was obtained to provide the energy necessary to form plasma. The existing aerosol mist delivery system was modified to work in a vacuum. Silicon dioxide and yttrium containing films were deposited in a vacuum. Coatings were analyzed with SEM and EDS analysis at Alfred University. Coatings were also analyzed with ESCA, SNMS, FTIR-ATR, SEM, and EDS at the labs of Osram Sylvania.
