RF Plasma Thin Film Deposition: Silicon Oxide and Yttrium Containing Films
Date
2004
Authors
Journal Title
Journal ISSN
Volume Title
Publisher
Alfred University. Faculty of Ceramic Engineering. Kazuo Inamori School of Engineering
Abstract
The atmospheric RF plasma thin film deposition system was reassembled and used to deposit SiO_{2} coatings. These coatings were deposited on microscope glass slide substrates as well as the exterior of cylindrical glass tubes. An aluminum rod was also used as a substrate. The atmospheric system was modified to work as a vacuum system so thin film coatings could be deposited on the interior of glass tubes. A water cooled coil was obtained to provide the energy necessary to form plasma. The existing aerosol mist delivery system was modified to work in a vacuum. Silicon dioxide and yttrium containing films were deposited in a vacuum. Coatings were analyzed with SEM and EDS analysis at Alfred University. Coatings were also analyzed with ESCA, SNMS, FTIR-ATR, SEM, and EDS at the labs of Osram Sylvania.
Description
Type
Thesis
item.page.format
Keywords
Vttria, rf plasma deposition, Thin films, Silica, Vacuum