Synthesis and Characterization of Iron-Copper Nitride Thin Films

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2016-09
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New York State College of Ceramics at Alfred University. Kazuo Inamori School of Engineering.
Abstract
In the present work, thin films of iron nitride and iron-copper nitride have been fabricated on silicon substrates by reactive magnetron sputtering. The experimental conditions such as reactive gas flow rate and power required to yield these films have been systematically varied. The structure, composition, and morphology of the asfabricated films have been investigated by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), energy dispersive x-ray spectroscopy (EDS), scanning electron microscopy (SEM) and x-ray reflectivity (XRR). The magnetic properties are characterized via vibrational sample magnetometry (VSM), and are found to be related to the structure, composition and morphology of the films. Results are discussed in terms of potential applications of these materials in magnetic applications.
Description
Advisory committee members: Steven Pilgrim, William Lacourse. Dissertation completed in partial fulfillment of the requirements for the degree of Masters of Science in Materials Science and Engineering at the Kazuo Inamori School of Engineering, New York State College of Ceramics at Alfred University
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